750₺ Üzeri Sepette Ek 100₺ İndirim

Tüm Alışverişlerde Peeling Etkili Kahve Kil Maskesi Hediye

Leke Karşıtı Kojik Asit Kil Maskesi 9 ml - Dermokil

Kojic Acid Clay Mask for Anti-Spot Removal, 9 ml

59.90₺
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Dermokil

Kojic Acid Clay Mask for Anti-Spot Removal, 9 ml

|1 reviews

59.90₺

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750₺ Üzeri 100₺ İndirim
Tüm Alışverişlerde Hediye Peeling Etkili Sıkılaştırıcı Kahve Kil Maskesi
Product Description

Dermokil Anti-Spot Kojic Acid Clay Mask 9 ml gently cares for the skin, helping it achieve a smoother, more vibrant, and brighter appearance with regular use. Its brightening effect supports a more even and balanced skin tone, while its clay content helps to deeply cleanse the skin. Its formula, which helps to remove dirt and excess sebum accumulated in pores, completes your skincare routine, supporting a cleaner, fresher, and healthier-looking complexion.

Active Ingredients

KOJIC ACID: Helps reduce the appearance of uneven skin tone and blemishes. With regular use, it helps the skin achieve a brighter, more balanced, and vibrant look.

Vitamin C: Helps to add radiance to the skin while reducing a dull and tired appearance. Its antioxidant effect helps protect the skin against environmental factors.

CLAY: Helps to deeply cleanse the skin. It helps to remove excess sebum, dirt, and toxins that accumulate in pores, resulting in a smoother and clearer complexion.

SHEA BUTTER: Helps to intensely nourish and moisturize the skin. It helps reduce tightness caused by dryness, leaving skin feeling softer and more comfortable.

How to Use

Apply a thin layer to a clean face, avoiding the eyes and surrounding area. After it dries completely (approximately 10 minutes), rinse with lukewarm water to cleanse the skin. You can use a makeup sponge or cotton pad to make rinsing easier. This application can be repeated 2-3 times a week. For sensitive skin, the waiting time can be shortened to 5 minutes.

Contents

Aqua, Clay, Glyceryl Stearate, Glycerin, Zea Mays Starch, Propanediol, Cetearyl Alcohol, Stearic Acid, Phenoxyethanol, Butyrospermum Parkii (Shea) Butter, Kojic Acid, Xanthan Gum, 3-O-Ethyl Ascorbic Acid, Titanium Dioxide, Tocopheryl Acetate, Allantoin, Caprylyl Glycol, CI 16255, CI 19140.

Warning

Avoid contact with eyes. In case of contact, rinse thoroughly with plenty of water. Store in a dry and clean place out of reach of children. Protect from direct sunlight. After washing the mask, there may be temporary redness, which is a natural effect. If it is too bothersome, the waiting time for the mask can be shortened. If an unexpected effect occurs, stop using it and rinse the applied area with plenty of water. Do not use on wounded or cut skin.

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